Physical Vapor Deposition (PVD) Coatings processes allow the deposition of high-quality tribological and functional layers in the range of thicknesses from a few nanometers to several tens of micrometers. Fraunhofer USA CCD facilities include various technologies such as high-rate evaporation and highly activated plasma processes as well as their combinations. A particular focus is placed on the extensive use of arc discharges as the most effective source of energetic vapor jets. We are leaders in the field of thin film coating technologies and offer the development of high performance wear coatings and the associated coating services.
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