Facilities

 

Physical Vapor Deposition (PVD)

We are leaders in the field of thin film coating technologies and offer the development of high performance wear coatings and the associated coating services.

 

Chemical Vapor Deposition (CVD)

- Single Crystalline Diamond (SCD)

- Polycrystalline Diamond (PCD)

- Boron-doped Diamond (BDD)

 

Post-processing and Microfabrication Equipment

 

Characterization

Fraunhofer CCD offers access to the joint Fraunhofer/University laboratories, which are located on the campus of Michigan State University in East Lansing, Michigan.